ADDITIONAL EXCITATION OF X-RAY FLUORESCENCE OF THE ANALYTE IN THE UNSATURATED LAYER WITH SUBSTRATE

V. Ya. Borkhodoev

Аннотация


This work is devoted to the dependency study between the intensity of the additional x-ray fluorescence of the analyte in the unsaturated layer lying on the substrate, the radiation of which can excite the fluorescence of the atoms of the analyte, and the layer thickness. The model for additional x-ray fluorescence is proposed, and the AlKα line measurements for unsaturated layers on Cu substrate are conducted. Calculation results based on models and measurements have shown that the dependence of the intensity of additional emission of the analyte from the thickness of the layer is characterized by a maximum. The presence of this maximum should be considered when measuring the thickness and chemical composition of unsaturated samples with the use of the substrate, the radiation of which excites the atoms of the analyte. This effect can be used to reduce the detection limit of the analyte in these samples, using the analysis of the optimum thickness of the layers.

Keywords: X-ray fluorescence, unsaturated layer, a substrate, an additional x-ray fluorescence

(Russian)

DOI:http://dx.doi.org/10.15826/analitika.2015.19.1.009

 

V.Ya. Borkhodoev

 North-East Interdisciplinary Science Research Institute n.a. N.A. Shilo, Far East Branch, Russian Academy of Sciences, Magadan, Russian Federation


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Литература


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