ADDITIONAL EXCITATION OF X-RAY FLUORESCENCE OF THE ANALYTE IN THE UNSATURATED LAYER WITH SUBSTRATE
Аннотация
This work is devoted to the dependency study between the intensity of the additional x-ray fluorescence of the analyte in the unsaturated layer lying on the substrate, the radiation of which can excite the fluorescence of the atoms of the analyte, and the layer thickness. The model for additional x-ray fluorescence is proposed, and the AlKα line measurements for unsaturated layers on Cu substrate are conducted. Calculation results based on models and measurements have shown that the dependence of the intensity of additional emission of the analyte from the thickness of the layer is characterized by a maximum. The presence of this maximum should be considered when measuring the thickness and chemical composition of unsaturated samples with the use of the substrate, the radiation of which excites the atoms of the analyte. This effect can be used to reduce the detection limit of the analyte in these samples, using the analysis of the optimum thickness of the layers.
Keywords: X-ray fluorescence, unsaturated layer, a substrate, an additional x-ray fluorescence
(Russian)
DOI:http://dx.doi.org/10.15826/analitika.2015.19.1.009
V.Ya. Borkhodoev
North-East Interdisciplinary Science Research Institute n.a. N.A. Shilo, Far East Branch, Russian Academy of Sciences, Magadan, Russian Federation
Полный текст:
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Liebhafscy H.A., Zemany P.D. Film thickness by X-ray emission spectrography. Analytical Chemistry. 1956, vol. 28, no. 4, pp. 455-459.
Nazarov V.V. Opredelenie tolshchiny i elementnogo sostava pokrytii rentgenofluorestsentnym sposobom [Determination of the thickness and elemental composition of the coatings by X-ray method]. Zavodskaia laboratoriia. Diagnostika materialov [Industrial laboratory. Diagnostics of materials], 1992, vol. 58, no. 1, pp. 27-29 (in Russian).
Dudik S.L., Kalinin B.D., Plotnikov R.I., Savelyev S.K. Otsenka glubiny vykhoda fluorestsentnogo izlucheniia iz prob issleduemykh materialov i opredelenie tolshchin plenok i pokrytii na rentgenovskom spektrometre ‘SPECTROSCAN MAKC-GV’ [Fluorescence efficiency with depth in various samples assessment and determination of film and coating thickness with «SPECTROSCAN MAKC-GV» Х-ray spectrometer]. Analitika i kontrol` [Analytica and control], 2006, vol. 10, no. 3-4, pp. 282-289 (in Russian).
Hirokava K., Suzuki M., Gotô H. Effect of backing metals in the X-ray fluorescence spectral analysis of metal films and its application. Z. Аnal. Chem., 1964, vol. 199, no. 2. pp. 89-94.
Ignatova Iu.A., Eritenko A.N., Revenko A.G., Tsvetianskii A.L. Rentgenofluorestsentnyi analiz tverdotel`nykh plenok i pokrytii [X-ray fluorescence analysis of solid films and coverings]. Analitika i kontrol` [Analytica and control], 2011, vol. 15, no. 2, pp. 126-140 (in Russian).
Naumtsev F.E., Volkov V.A., Losev N.F. Effekt podvozbuzhdeniia pri rentgenofluorestsentnom analize ionno-implantirovannykh sloev [The effect of additional excitation X-ray fluorescence analysis of ion-implanted layers]. Zavodskaia laboratoriia. Diagnostika materialov [Industrial laboratory. Diagnostics of materials], 1988, vol. 54, no. 4, pp. 30-33 (in Russian).
Mantler M. X-ray fluorescence analysis of multiple-layer films. Anal. Chim. Acta, 1986, vol. 188, ppP. 25-35.
Pavlinskii G.V., Pan`kov L.V. Vychislitel`noe modelirovanie analiticheskikh situatsii pri rentgenofluorestsentnom opredelenii tolshchiny i sostava pokrytii [Computational modeling situations when XRF analytical determination of the thickness and composition of the coatings]. Defektoskopiia [Defectoscopy], 1993, no. 12, pp. 72-82 (in Russian).
Losev N.F. Kolichestvennyi rentgenospektral`nyi fluorestsentnyi analiz [X-ray quantitative fluorescence analysis]. Moskva: Nauka, 1969, 336 p. (in Russian)
Gradshtein I.S., Ryzhik I.M. Tablitsy integralov, summ, riadov i proizvedenii [Tables of integrals, sums, series and multiplication]. Moskva: Nauka, 1971, 1108 p. (in Russian)
Blokhin M.A., Shveitser I.G. Rentgenospektral`nyi spravochnik. [X-ray handbook]. Moskva, Nauka, 1982. 376 p. (in Russian).
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