THICKNESS DETERMININATION OF ELECTROPLATED Ni-P, Sn-Bi AND Sn-Pb COATINGS BY ATOMIC EMISSION SPECTROMETRY WITH A DIRECT CURRENT GLOW DISCHARGE

A. L. Chicherskaia, A. A. Pupyshev

Аннотация


Glow discharge atomic emission spectrometry allows determining the chemical composition of the coatings and their thickness as well as to conduct the depth analysis. Atomic-emission determination of the coating thickness on a single calibration curve can be performed by using the sputtering rates of coatings with different chemical composition.

To realize this method the set of comparative samples with Ni-P coating was made. Samples are certified for the coating thickness by a regulated chemical, metallographic and X-ray fluorescence analysis methods. Using the atomic emission spectrometer with a dc glow discharge under optimal operating parameters, which provides a flat bottom of the crater, the calibration curve for dependence of the Ni-P coating thickness against its cathode etching was obtained. It is shown that the metrological characteristics of the current method for control of Ni-P coating thickness is not worse than the methods regulated by GOST.

Samples of Sn-Bi and Sn-Pb coatings were made. The thickness of the coating was determined by the regulated methods of analysis, the optimal operating parameters of the glow discharge, which provides a flat bottom of the crater, were determined, and the absolute and relative sputtering rates of coatings in dc glow discharge were measured. Using the atomic emission calibration curve for Ni-P coating and established relative rates of sputtering, the thickness of Sn-Bi and Sn-Pb coatings was determined. It is shown that the metrological characteristics of this method are not worse than the methods regulated by GOST.

Methodology for measuring the thickness of Ni-P, Sn-Bi and Sn-Pb coatings using atomic emission spectrometry with a dc glow discharge was developed and certified.

Key words: atomic emission spectrometry, DC glow discharge, electroplating Ni-P, Sn-Bi and Sn-Pb, sputtering rate, operating parameters of the discharge, thickness of the coating.

(Russian)

DOI:http://dx.doi.org/10.15826/analitika.2015.19.1.007

 

A.L. Chicherskaia, A.A. Pupyshev

Ural Federal University named after the first President of Russia B. N. Yeltsin,

 Yekaterinburg, Russian Federation


Полный текст:

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Литература


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